A physics-accurate lithography and OPC simulator for the browser.
litopc runs Hopkins coherent imaging in your browser — no installation, no EDA license, no setup. Place a mask, simulate the aerial image, inspect the contour, and iterate.
What it does
litopc simulates how a mask pattern prints onto silicon under DUV (193 nm) and EUV (13.5 nm) illumination. The core workflow: design or load a mask, run a Hopkins TCC-based aerial image simulation, overlay the printed contour, measure EPE and CD, and apply iterative OPC correction. All in a single browser tab.
The physics engine
The simulator is built on the Hopkins coherent imaging formulation — the same framework used in commercial litho tools. Resolution limits follow the Rayleigh criterion (CDmin = k1 × λ / NA), computed per preset. Four optical configurations are included: DUV dry (NA 0.93), DUV immersion (NA 1.35), EUV Low-NA (NA 0.33), and EUV High-NA (NA 0.55).
Plans
The Free plan includes DUV dry and EUV Low-NA presets, all OPC templates, manual mask editing, and 20 simulation runs per day. Pro adds immersion and High-NA optics, 3D silicon view, batch parameter sweep, and higher export resolution. The Research plan adds custom resist model parameters (Mack model), etch bias correction, and Bossung curve generation for process window analysis.
Scope
litopc is a simulation and visualization tool — not a manufacturing sign-off platform. It is well-suited for process exploration, parameter studies, figure generation, and learning the physics of optical lithography. It is not a substitute for Calibre, Synopsys, or other full-node OPC sign-off flows.
The creator
litopc was built by Min-Cheol Lee — OPC and lithography engineer at Intel, Ph.D. in Physics. Research background in optical and condensed matter physics, with hands-on OPC experience across advanced DUV and EUV nodes. More at mincheollee.com.