Sweep Studio
Scan dose and geometry windows quickly, then inspect contour movement in one timeline.
Optical Proximity Correction Simulator
Pattern decisions that print right at nanometer scale.
Explore lithography behavior with Sweep Mode, A/B comparison, and synchronized 2D/3D views in one fast workflow.
Mask
Contour
Aerial
Sweep mode | dose 0.42 | 9 points | CD stable
What is OPC?
OPC (Optical Proximity Correction) pre-distorts mask geometry so the wafer print lands on target.
In advanced semiconductor manufacturing, OPC directly impacts CD control, yield, and process window margin.
A/B Comparison
Place two mask strategies on one frame and choose the better process target with measurable delta.
2D + 3D Panels
Read contour behavior in 2D and depth context in 3D, synchronized from one input state.
Build process intuition before expensive fab iterations.
Open the simulator and run your first sweep in under a minute.
Launch Simulator